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Extra resources for Advanced High Speed Devices (Selected Topics in Electronics and Systems)
However, the electrons are weakly photoexcited at the InGaAs/GaAs heterointerface via multi-step processes due to the existence of deep trap centers27. The photoelectrons are injected to the channel immediately due to the strong gate-to-channel electric field. When the plasma wave resonance is excited, the DC drain-source potential is modulated because of the non-linear properties of the plasma fluid4. Therefore, the resonant intensity was measured by monitoring the DC modulation component ∆VDS of the drain potential, which is called hereafter the photoresponse.
The quadratic region suggests that the channel is being modulated by a depletion region in a similar fashion as a field effect device whereby as the gate voltage becomes more positive, a conducting channel opens. The linear region appears to form as a result of the channel being closed off by a depletion region induced by the other gate, even though locally the channel is being enhanced by the positive gate. As suggested by K. 2 Volt, for the graph in Figure 3, is the transition region between the quadratic channel opening and the linear pinch-off of the channel.
Large mass and greater valley degeneracy always result in a smaller turn on resistance at low drain bias in the ballistic limit. Valley degeneracy may have positive or negative influence on saturation current depending on the EOT. 5. Acknowledgement This work has been partly supported by the SRC Non-classical CMOS Research Center (2006-VC-1437) and partly by the National Science Foundation. References 1. B. Yu, L. Wang, Y. Yuan, Y, Taur, P. Asbeck, “Scaling of nanowire transistors”, accepted by Trans.